Titanium >4N5 High-purity titanium 4N5(purity: 99.995%) and 5N (purity:99.999%) Shenzhen Sunrise Metal Industry Co.,Ltd 深圳市东升稀有金属有限公司

Titanium

>4N5 titanium Metals - High-Purity TitaniumShenzhen Sunrise Metal Industry Co.,Ltd 深圳市东升稀有金属有限公司 0086-0755-27185042  http://www.sunriseta.com sales@sunriseta.com skype :Li.mary9 QQ : 1957953030 wahtsapp :15919982500 　High-purity titanium 4N5(purity: 99.995%) and 5N (purity:99.999%) are used as sputtering target material for thin-film formations of semiconductors including DRAMs. This titanium contributes towards improved semiconductor performance. Uses Titanium sputtering targets for semiconductors, LCD flat panels, etc. Product Line Purity up to 5N Form: ingot, billet Specifications Example of Specifications (4N5) [Ti : % min., others : ppm max.]   Ti Fe Ni Cr Mn Al Si Sn Cu Na K O C Guaranteed 99.995 15 10 5 5 5 5 5 5 0.05 0.05 500 50 Typical Balance 5 3 <1 <1 <1 <1 <1 <1 <0.05 <0.05 250 20 • Gaseous contents are not counted as impurity. • Specifications are to be met with specific requirements from individual customers.Shenzhen Sunrise Metal Industry Co.,Ltd 深圳市东升稀有金属有限公司 0086-0755-27185042  http://www.sunriseta.com sales@sunriseta.com skype :Li.mary9 QQ : 1957953030 wahtsapp :15919982500Titanium Sputtering Targets pure titanium in most standard configurations benefits • Purities ranging from 4N5 to 5N8 • Lowest Oxygen content material in the industry • Recycling program for reclaimed scrap targets • Highest strength bonding technologies available applications • Liner and Barrier Applications for Advanced Semiconductor Processes • Anti-reflective Coatings configurations • Anelva • TEL • AMAT • Trikon • Novellus • ULVAC (Most standard target configurations available) Daily Monitor Defect data 0 10 20 30 40 50 60 70 80 90 100 4N5 Ti Target <400 ppm O UCL Average 4N5: 29.14 Average 5N: 14.43 Endura 5500 TiN 101 200mm <250 ppm O 5N Ti Target Defect Data Defect Data Particle data 0 10 20 30 40 50 60 70 80 90 100 Normalized Defect Data UCL Average 4N5: 31.4 Average 5N: 16.4 Endura 5500 TiN 101 200mm Normalized Defect Data <400 ppm O 4N5 Ti Target 22% OOC <250 ppm O 5N Ti Target 7% OOC Oxygen Effect on TiN Defect Performance 7/14/00 9/14/00 11/14/00 1/14/01 3/14/01 5/14/01 7/14/01 9/14/01 11/14/01 1/14/02 3/14/02 5/14/02 7/14/02 0.0µ 2.0µ 4.0µ 6.0µ 8.0µ 10.0µ 12.0µ 14.0µ Honeywell OGrain Size<10 micron T ffers Ti with <10µm itanium Grain S